- •ACKNOWLEDGMENTS
- •TABLE OF CONTENTS
- •LIST OF TABLES
- •LIST OF FIGURES
- •INTRODUCTION
- •2.1.1 Structural Properties
- •2.1.2 Physical Properties
- •2.1.3 Electrical Properties of InN
- •2.1.3.1 Background Defects
- •2.1.4 Optical Properties of InN
- •2.2.1 Thermodynamic Models in Solid Solution
- •2.2.1.1 Regular Solution Model
- •2.2.1.2 Bonding in Semiconductor Solid Solutions Model
- •2.2.1.4 Strain Energy Model
- •2.2.1.5 First-Principal Models
- •2.2.2 Thermodynamic Analysis of InN
- •2.2.3 Phase Separation in InxGa1-xN
- •2.3.1 Growth Temperature and V/III Ratio
- •2.3.2 Nitrogen Source
- •2.4 Indium Nitride (InN) Growth Techniques
- •2.4.1 Chemical Vapor Deposition (CVD)
- •2.4.1.1 Metal-Organic Vapor Phase Epitaxy (MOVPE)
- •2.4.1.2 Hydride Vapor Phase Epitaxy (HVPE)
- •2.4.1.3 Plasma Enhanced Chemical Vapor Deposition (PECVD)
- •2.4.3 Atomic Layer Deposition (ALD)
- •2.5 Substrate Materials
- •2.5.1 Sapphire Substrate (Al2O3) (0001)
- •2.5.2 Silicon (Si) Substrate
- •2.5.4 Other Substrates
- •2.5.5 Buffer Layer
- •2.6 Summary for Growth of InN on Different Substrate
- •2.6.2 Growth on Silicon (Si) Substrate
- •2.6.3 Growth on Gallium Arsenide (GaAs) Substrate
- •2.6.4 Growth on Gallium Phosphorus (GaP) Substrate
- •2.7 Overview
- •THERMODYNAMIC ANALYSIS OF InN AND InXGa1-XN MOVPE GROWTH
- •3.1 Thermodynamic Analysis of InN and InxGa1-xN
- •3.1.1 Reaction Mechanism and Kinetics of InN MOVPE
- •3.2.1 Boundary Passivation Method with Hydrogen
- •5.1. Indium Nitride (InN) Growth Optimization
- •5.1.1. Substrate Selection
- •5.1.1.1. Sapphire (c-Al2O3 (0001))
- •5.1.1.2. Gallium Nitride (GaN/c-Al2O3 (0001))
- •5.1.1.3. Silicon (Si (111))
- •5.1.2. Substrate Preparation Procedure
- •5.1.3. Metal-Organic Vapor Phase Epitaxy (MOVPE) Reactor
- •5.1.4. Growth Chemistry and Conditions for InN Growth
- •5.1.5. Indium Nitride (InN) Growth and Optimization
- •5.1.5.1. Influence of Growth Temperature
- •5.1.5.2. Influence of Substrate Nitridation
- •5.1.5.3. Influence of N/In Ratio
- •5.1.5.4. Influence of Buffer Layer and Morphological Study
- •5.1.5.5. Influence of Pressure
- •5.1.5.6. Optical and Electrical Properties
- •5.1.5.7. Summary
- •5.1.6. Indium Nitride (InN) Droplet Formation
- •5.1.7. Annealing Effect
- •5.3. Inlet Tube Modification and Growth Results
- •CONCLUSIONS
- •LIST OF REFERENCES
- •BIOGRAPHICAL SKETCH
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difference in energy between the several tetrahedral types is much greater than kT for many types of tetrahedrals. Taking into account the effects of the resulting short-range order (SRO) makes the calculation of the mixing enthalpy difficult, since it couples the two factors [Ich86]. These problems can be surmounted by considering a large ensemble of several hundred atoms with the positions of each allowed to relax while maintaining a relatively simple calculation by considering only the dilute limit, where the effect of the SRO is negligible [Sch91, Ho96]. This approach was developed specifically for dealing with systems with very low solubility limits, in particular for the solubility of the very small N atom in conventional III/V semiconductors such as GaAs, InP, GaP, and so forth.
2.2.1.5 First-Principal Models
Advances in fundamental insight for the energy of a semiconductor lattice and the methodology of solving mathematical problems of large matrices have been achieved recently due to the availability of high-powered computers.
These achievements can make possible the first-principle local density selfconsistent total energy minimization calculations in semiconductor alloy systems [Zun94]. Using these quantum mechanical calculations, the thermodynamics of semiconductor solid solutions can be calculated without any of the extreme simplifying approximations necessary to obtain simple analytic models.
The total energy minimization calculations are based on the entire complex band structures. The results from such calculations are included in Table 2-4. The mixing enthalpies have also been calculated for InxGa1-xN, InAlN, and AlGaN alloys using a pseudopotential perturbation approach [Ito97].
