ЭБНЭ_full
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LOCOS –step 4
Formpmos S/D
•Cover with photoresist
• Pattern photoresist
– *PSELECT MASK
•Implant p-type dopants
•Remove photoresist
p+ dopant |
p+ dopant |
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POLY mask
LOCOS FabricationIllustration |
Prof.A. Mason |
Page 32 |
LOCOS –step 5
Formnmos S/D
•Cover with photoresist
NSELECT mask
p+ |
p+ |
p+ |
n
POLY mask
LOCOS FabricationIllustration |
Prof.A. Mason |
Page 33 |
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LOCOS –step 5 |
Formnmos S/D |
NSELECT mask |
•Cover with photoresist
• Pattern photoresist |
p+ |
p+ |
p+ |
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– *NSELECT MASK |
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POLY mask
LOCOS FabricationIllustration |
Prof.A. Mason |
Page 34 |
LOCOS –step 5
Formnmos S/D
•Cover with photoresist
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Pattern photoresist |
n+ |
p+ |
p+ |
n+ |
n+ |
p+ |
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– *NSELECT MASK |
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• Implant n-type dopants |
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n+ dopant |
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n+ dopant |
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Remove photoresist |
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POLY mask
LOCOS FabricationIllustration |
Prof.A. Mason |
Page 35 |
LOCOS –step 6
Form Contacts
•Deposit oxide
•Deposit photoresist
CONTACT mask
n+ |
p+ |
p+ |
n+ |
n+ |
p+ |
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CONTACT mask
LOCOS FabricationIllustration |
Prof.A. Mason |
Page 36 |
LOCOS –step 6
Form Contacts |
CONTACT mask |
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Deposit oxide |
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Deposit photoresist |
n+ |
p+ |
p+ |
n+ |
n+ |
p+ |
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Pattern photoresist |
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–*CONTACT Mask
–One mask for both active and poly contact shown
CONTACT mask
LOCOS FabricationIllustration |
Prof.A. Mason |
Page 37 |
LOCOS –step 6
Form Contacts
•Deposit oxide
•Deposit photoresist
•Pattern photoresist
–*CONTACT Mask
–One mask for both active and poly contact shown
•Etch oxide
n+ |
p+ |
p+ |
n+ |
n+ |
p+ |
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LOCOS FabricationIllustration |
Prof.A. Mason |
Page 38 |
LOCOS –step 6
Form Contacts
•Deposit oxide
•Deposit photoresist
•Pattern photoresist
–*CONTACT Mask
–One mask for both active and poly contact shown
•Etch oxide
•Remove photoresist
•Deposit metal1
–immediatelyafter opening contacts so no nativeoxide grows in contacts
•Planerize
–make top level
n+ |
p+ |
p+ |
n+ |
n+ |
p+ |
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LOCOS FabricationIllustration |
Prof.A. Mason |
Page 39 |
LOCOS –step 7
Form Metal 1 Traces
METAL1 mask
• Deposit photoresist
n+ |
p+ |
p+ |
n+ |
n+ |
p+ |
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METAL1 mask
LOCOS FabricationIllustration |
Prof.A. Mason |
Page 40 |
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LOCOS –step 7 |
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Form Metal 1 Traces |
METAL1 mask |
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Deposit photoresist |
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Pattern photoresist |
n+ |
p+ p+ |
n+ n+ |
p+ |
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– *METAL1 Mask |
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METAL1 mask
LOCOS FabricationIllustration |
Prof.A. Mason |
Page 41 |