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84 Surface Modication of Magnesium and its Alloys for Biomedical Applications
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2
Surface design of biodegradable magnesium alloys for biomedical
3
applications
P.K. Chu, G.S. Wu
City University of Hong Kong, Hong Kong, China
3.1 Introduction
Surface is crucial to biomaterials because it not only provides a platform for cell/ biomaterial interactions and associated chemical reactions, but also acts as a shield to resist corrosion or wear in the physiological environment. Magnesium (Mg), as the fourth most abundant cation in the human body, is essential to human metabolism and naturally found in bone tissues (Staiger, Pietak, Huadmai, & Dias, 2006). However, compared to traditional biometals such as Ti-based alloys, biodegradable Mg alloys have a more reactive surface and normally degrade too quickly, especially in the initial stage under physiological conditions (Jame sh, Kumar, & Narayanan,
2011; Song, 2007; Witte et al., 2006; Wu, Zhao, Zhang, Jamesh, & Chu, 2013).
Adverse effects can occur to the patients if excessive Mg ions and other corrosion products cannot be effectively absorbed by the surrounding tissues or excreted prop­erly. Moreover, rapid degradation will bring about premature failure, thereby inducing Mg-based implants to lose the desirable ability of osteosynthesis and counteracting the capability of Mg alloys to mitigate the stress-shielding effect as a result of their Youngs modulus (E ¼ 41e45 GPa) being similar to that of bones (E ¼ 3e20 GPa) (Wu, Zhao, et al., 2013; Zberg, Uggowitzer, & L€offler, 2009).
Surface modication is one of the desirable methods to overcome the drawbacks and expedite the development of new-generation biodegradable metals (Narayanan, Park, &
Lee, 2014; Wu, Jamesh, & Chu, 2013). A temporary surface fabricated on Mg-based
materials can be used to tailor the mechanical performance, corrosion behavior, and biological properties to meet clinical requirements. In this chapter, the common surface treatment techniques suitable for Mg alloys and the design principles in the develop­ment of degradable Mg alloys to address clinical needs are discussed. The role of the various coating techniques and ion implantation are described with examples.
3.2 Surface modication techniques
Several coating technologies are applicable to Mg and its alloys, including electro­chemical plating, conversion coatings, anodizing, organic coatings, and vapor-phase processes. Each of them has special advantages and limitations, and they are brie y described in the following sections.
Surface Modication of Magnesium and its Alloys for Biomedical Applications. http://dx.doi.org/10.1016/B978-1-78242-077-4.00003-6
Copyright © 2015 Elsevier Ltd. All rights reserved.
90 Surface Modication of Magnesium and its Alloys for Biomedical Applications
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3.2.1 Electrochemical deposition
Electrochemical deposition or plating is an old but practical technique to deposit metallic coatings. It is usually subdivided into two types: electroplating and electroless plating. In both cases, the metal salt in a solution is reduced to the metallic form on the surface of the substrate. The distinction between electroplating and electroless plating is that the electrons for reduction in electroplating are supplied by an external source, whereas the reducing electrons in electroless plating are supplied by a chemical reducing ag ent in the solution or, in the case of immersion plating, the substrate itself (Gray & Luan, 2002).
3.2.1.1 Electrodeposition
In electrodeposition or electroplating as schematically illustrated in Figure 3.1, the sur­face of a substrate is modied in an aqueous or nonaqueous electrolytic environment by applying external power. In the electrolysis cell, the sample being plated is the cath­ode and immersed in a solut ion containing the requi red metal in an oxidized form. The anode is made of the metal to be deposited on the substrate. When power is turned on, the met al atoms are oxidized and dissolved in the solution according to the following reaction: Me(s) / Me electrolyte are reduced at the interface between the solution and the cathode according to the reaction: Me solved is equal to the rate at which the cathode is plated. Hence, the ions in the bath are continuously replenished by the anode. In addition, a nonconsumable anode such as lead or carbon can be used in electrodeposition. In this case, ions of the metal to be plated must be periodically replenished in the bath after they have been extracted from the solution. At present, electroplating is widely used in the industry to coat
nþ
(aq) þ ne. On the cathode, the dissolved metal ions in the
nþ
(aq) þ ne/ Me(s). Usually, the rate at which the anode is dis-
Figure 3.1 Schematic illustrating the setup in electrodeposition.
Source: Sudagar et al. (2013)
and Carraro et al. (2007) with permission from Elsevier.
e
Anode
+–
Power
n+
Me
Cathode
e
Surface design of biodegradable magnesium alloys for biomedical applications 91
metallic products. The technique can provide protection against species in aggressive environments and even render the productsspecial surface properties such as decora­tive effects (Carraro, Maboudian, & Magagnin, 2007; Kanani, 2005; Schlesinger
& Paunovic, 2010; Sudagar, Lian, & Sha, 2013).
3.2.1.2 Electroless deposition
In comparison to electrodeposition, electroless deposition or plating uses only one electrode and no external power source. The electroless deposition process can be divided into two types: autocatalytic deposition and galvanic displacement. In autocat­alytic deposition, reduction of metallic ions in the solution and lm deposition can be carried out by oxidation of the chemical compound in the solution itself, that is, a reducing agent. This reducing agent at a dened temperature that depends on the reducing agent and bath composition can spontaneously oxidize and free electrons for the reduction of metallic ions. Thus, it is named autocatalytic because oxidation of the reducing agent can start or become self-sustained only on the deposited metal surface. Figure 3.2 shows a schematic of electrole ss deposition with the reducing agent as the source of electrons. Galvanic displacement or immersion plating has a mecha­nism different from that of autocatalytic deposition. In immersion plating, reducing agents are not required because the base materials can behave as the reducing agent. Galvanic displacement takes place when the base material is displaced by a metallic ion in the solution having a lower oxidation potential than the displaced metal ion. As a sequence, the base material is dissolved in the solution and the metallic ions in
R
R
R
R
R
R
e
n+
M
M
n+
M
ElectrolyteSubstrate
Figure 3.2 Electroless deposition with reducing agent (R) as the source of electrons.
Source: Sudagar et al. (2013) and Carraro et al.
(2007) with permission from Elsevier.
n+
M
92 Surface Modication of Magnesium and its Alloys for Biomedical Applications
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Specimen rotator
Thermometer
(90 °C)
Electroless nickel
bath
Water area
Figure 3.3 Experimental apparatus of electroless nickel plating.
Source: Li et al. (2006) with permission from Elsevier.
Thermostat
Teflon cap
Samples
Temperature control
the solution are reduced on the surface of the base material (Carraro et al., 2007;
Kanani, 2005; Schlesinger & Paunovic, 2010; Sudagar et al., 2013).
Figure 3.3 depicts a simplied schematic of the apparatus used in electroless nickel
plating. This apparatus consists of a plating tank, thermost at for temperature control, and specimen rotator. The samples are placed in a glass tank covered with a Teon cap with the thermostat (Li, An, & Wu, 2006). Electroless plating has advantages over electroplating because power sources are not needed. Autocatalytic deposition can also avoid the effects of current distribution, thereby improving the thickness uni­formity. Therefore, it is more suitable for plating components with a complex shape. The typical disadvantages are that the plating process is usually slower and cannot create thick coatings. Consequently, electroless deposition is commonly used for decorative purposes under mild working conditions.
3.2.2 Chemical conversion coatings
3.2.2.1 General aspects
Chemical conversion is one of the important coating techniques to prepare coatings on metals by converting the part of the surface into the coating by means of a chemical or electrochemical process. The produced surface layer can be composed of metal oxides, chromates, phosphates, or other compounds that are chemically bonded to the surface. Because conversion coatings are formed in situ, adhesion to the subst rate is generally very good, and so conversion as a pretreatment is effective in improving adhesion of the nal coating. Several different types of conversion coatings have been developed by, for instance, chromate, phosphate/permanganate, and uorozirconate treatments. One of the main disadvantages of conversion coatings is the toxicity of the treatment solutions. The conventional conversion coatings are based on chromium compounds that have been shown to be toxic and carcinogenic, and it is imperative to develop environmentally friendly processes. Besides, conversion coatings suffer from the nonuniform surface composition. If a conversion coating with uniform composition is needed, all the elements should be present in the alloy uniformly. At present,
Surface design of biodegradable magnesium alloys for biomedical applications 93
conversion coatings are mainly used for corrosion protection, hardness improvement, and color change as well as paint primers (Gray & Luan, 2002; Hornberger, Virtanen,
& Boccaccini, 2012).
3.2.2.2 Anodization and microarc oxidation
Anodization is a type of classical electrochemical conversion. It encompasses elec­trode reactions in combination with an electric eld-driven metal and oxygen ion diffu­sion, leading to the formation of an oxide lm on the anode surface. The structural and chemical properties of the anodic oxides can be varied over a wide range by altering the process parameters, such as anode potential, electrolyte composition, temperature, and current. Anodic oxidation is a well-established method and can produce different types of protective oxide lms on metals with excellent adhesion and bonding (Liu, Chu, & Ding, 2004).
Microarc oxidation (MAO), also known as plasma electrolytic oxidation (PEO), is an electrochemical surface treatment process based on anodizing. Compared to con­ventional anodizing, it uses much higher potentials. Figure 3.4 presents the schematic of microarc oxidation and the related electrical circuit. The sample is immersed in a bath containing the special electrolyte and forms one of the electrodes in the electro­chemical cell, with the other counter-electrode being made from an inert material such as stainless steel. Potent ials of more than 200 V are applied between these two electrodes. They may be in the forms of continuous or pulsed direct current (DC) or alternating pulses in which the stainless steel counter electrode may be grounded. When the potential exceeds the dielectric breakdown potential of the oxide lm, discharges occur, resulting in localized plasma reactions to modify the oxide. Similar to conventional anodic oxidation coating, the coating adheres better to the substrate
Copper anode bar
Sample
Electrolyte
Stainless steel counter electrode
Figure 3.4 Schematic of microarc oxidation.
Source: Dunleavy et al. (2009) with permission from Elsevier.
Variable number
of capacitors 2–150 μF
100 × V probe
1 × V probe
Scope ground
Single phase
50 Hz AC
PC
Oscilloscope
94 Surface Modication of Magnesium and its Alloys for Biomedical Applications
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metal than that formed by plasma spraying, because the MAO coating is a chemical conversion of the substrate metal into its oxide growing both inward and outward from the original metal surface. This process can produce thick (tens or hundreds of micrometers) and largely crystalline oxide coatings on metals such as titanium (Ti), aluminum (Al), and Mg. The coating provides high hardness, a continuous barrier against wear, corrosion, and heat, and electrical insulation. Usually the coating prop­erties depend on the substrate as well as composition of the electrolyte and electrical regime (Curran & Clyne, 2005a, 2005b, 2006; Dunleavy, Golosnoy, Curran, & Clyne,
2009).
3.2.3 Physical vapor deposition
In physical vapor deposition (PVD), atoms or molecules are deposited onto a substrate from a vapor phase. The process can be roughly divided into three steps: generation of particles from the target materials, transportation, and lm growth. To obtain the desir­able lms, substrate temperature, particle energy, reactive gas properties, and lm density need to be tailored in the PVD process. Compared to wet coating methods such as electroplating and microarc oxidation, PVD is a dry coating method and boasts unique merits such as low deposition temperature, strong adhesion, multicomponent layers, and high coating density. Evaporation, sputter deposition, and ion plating are the three main types of PVD (Gray & Luan, 2002; Liu et al., 2004).
3.2.3.1 Evaporation
Evaporation is one of the most widely used thin lm deposition techniques. A solid material is heated in a vacuum chamber to a temperature that generates some vapor from the material. In vacuum, the vaporized particles can travel directly to the target or substrate without encountering too many collisions and condense to the solid state, forming a lm. Generally speaking, an evaporation system requires a main chamber, vacuum pump, and energy source that evaporates the materials. The source is normally placed on the bottom of the chamber, often in an upright crucible because it becomes liquid during heating in most cases. The substrates are held inverted by suitable xtures on the top of the chamber with surfaces to be coated facing down toward the vapor source. A lament or electron beam source is typically used to vaporize the materials (Harsha, 2006; Mattox, 2010a; Wasa, Kanno, & Kotera, 2012).
3.2.3.2 Sputtering
Sputtering is another widely used thin lm fabrication technique. Sputtering is a process in which ionized atoms are accelerated to a target surface to eject atoms from the surface. The ejected atoms are then condensed onto a sample to be plated, forming a thin lm composed of sputtered materials. Sputter deposition has many ad­vantages over other deposition methods such as evaporation, electroplating, and chem­ical vapor deposition (CVD). For example, sputter deposition can form smooth, dense, conformal, and continuous lms more easily than evaporation because it produces a high-energy ux that leads to high surface mobility on the substrate surface. Usually,