- •Task №1
- •3. Evaluation of the tangential sensitivity of the detector diode
- •4. The main similarities and differences in the functional role, structure, and parameters of microwave devices numbered 1 (detector diode) and 2 (pin diode)
- •4.1 Detector diode
- •4.1.1 The functional role of the detector diode
- •4.1.2 Structure of the detector diode
- •4.1.3 Parameters of the detector diode
- •1. Volt-ampere characteristic:
- •2. Total resistance:
- •3. Cutoff frequency:
- •4. Current sensitivity:
- •5. Tangential sensitivity:
- •6. Noise ratio:
- •4.2 Pin diode
- •4.2.1 The functional role of the pin diode
- •4.2.2 Pin diode structure
- •4.2.3 Pin diode parameters
- •1. Volt-ampere characteristic:
- •2. Transmission and locking losses:
- •3. Quality coefficient:
- •4. Turn-on time of the pin diode:
- •5. Cutoff frequency:
- •4.3 Similarities and differences of the detector diode and pin diode
- •4.3.1 Differences between the detector diode and pin diode
- •4.3.2 Similarities of the detector diode and pin diode
- •5. Description of circuit models of microwave diodes with positive dynamic resistance
- •5.1 Description of the pin diode circuit model
- •5.2 Description of the mixer diode circuit model
- •Task №2 Diodes with negative dynamic resistance.
- •1.2 Gunn diode graphs (GaAs)
- •2. Representation of the device in the form of a layered structure with different differential mobility
- •2.1 Representation of the impatt diode in the form of a layered structure with different differential mobility
- •2.2 Representation of the Gunn diode in the form of a layered structure with different differential mobility
- •Task №3 Transistors.
- •1.2 Calculation of the gate length of a field-effect transistor
- •1.3 Analysis of the obtained results of calculating the thickness of the bipolar transistor base and the gate length of the field effect transistor
- •1.4 Calculation of the angle of flight of a bipolar transistor
- •1.5 Calculation of the angle of flight of a field-effect transistor
- •2.1 Advantages and disadvantages of hemt (High Electron Mobility Transistor)
- •2.2 Advantages and disadvantages of transistors with ballistic transport
- •2.3 Calculation of the thickness of the high-alloyed hemt region
- •3.1 GaN usage trend
- •3.2 InP usage trend
- •3.3 SiC usage trend
- •3.4 Diamond (c) usage trend
- •4.1 Input and output volt-ampere characteristics of three sbgfet with the same size, doping level, but made of Si, GaN, GaAs
- •4.2 How will the characteristics change if the gate width is increased
- •6. Connection of low-frequency noise with transistor manufacturing technology
- •7. Image of a low-signal equivalent Schottky-barrier transistor circuit. Explanation of how such a scheme is better or worse than s-parameters
2.3 Calculation of the thickness of the high-alloyed hemt region
The thickness of the high - alloyed HEMT region is expressed from the following formula [27]:
=
(30)
where
A – thickness of the high-alloy area;
=
,
at the same time
= 12,5 – for GaAs;
= 8,85
10-12
F/m.
Then, from formula (30) we express A:
A =
(31)
Hence, by the formula (31) we calculate A:
A =
=
=
32,69
10-9
m
=
32,69 nm
2.4 Estimation of the distance by which an electron can move from the equilibrium position in this layer at T = 300 K
The distance by which an electron can shift is determined from the expression for the Debye length [28]:
LD
=
(32)
From here, we calculate the distance by which an electron can move from the equilibrium position at T = 300 K:
LD
=
=
=
8,12
10-9
m
=
8,12 nm
3. Substantiation of the trend of using materials such as GaN, InP, SiC, diamond C in modern transistors, using the concepts: band gap width, low-field mobility, maximum drift velocity, crystal lattice constant
Table 1. Comparative characteristics of materials [29]
Material characteristics |
Si |
GaAs |
GaN |
6H-SiC |
|
C, (Diamond) |
InP |
1. Width of the bandgap, eV |
1,12 |
1,42 |
3,4 |
3,03 |
3,26 |
5,45 |
1,34 |
2. Critical field strength, kV/cm |
300 |
400 |
3000 |
2500 |
2200 |
10000 |
350 |
3. Mobility, cm2/(V s) |
1300 |
8500 |
1500 |
260 |
500 |
2200 |
5000 |
4. Saturation velocity, 105 m/s |
1,0 |
2,0 |
2,7 |
2,0 |
2,0 |
2,7 |
2,2 |
5. Heat conductivity, W/(m K) |
150 |
50 |
150 |
490 |
4901 |
2200 |
68 |
6. Relative dielectric permeability |
11,9 |
12,5 |
9,5 |
9,66 |
10,1 |
5,5 |
12,4 |
7. Maximal work temperature, K |
100 |
150 |
400 |
300 |
300 |
500 |
100 |
The properties of materials with a wide band gap allow the devices to operate at extreme temperatures, excessive specific powers, increased voltages and higher frequencies, which makes them ideal for use in future electronic systems. For example, silicon carbide (SiC) and gallium nitride (GaN) are specialized WBG semiconductor materials (with a wide band gap) based on the fact that a large amount of energy is required to move electrons in these materials from the valence band to the conduction band. In the case of silicon carbide (SiC), the value is approximately 3,2 eV; in the case of gallium nitride (GaN), it is 3,4 eV, while for silicon (Si) it is 1,1 eV. The physical property of a three times wider band gap leads to a higher voltage required for breakdown, in some applications reaching up to 1700 V [30].
